Annealing furnace is a process used in the manufacture of semiconductor devices, which includes heating a plurality of semiconductor wafers to affect their electrical properties. Heat treatment is designed for different effects. The wafer can be heated to activate dopant, convert thin film to thin film or convert thin film to wafer substrate interface, compact the deposited film, change the state of the grown film, repair injection damage, move dopant or transfer dopant from one thin film to another thin film or from film to wafer substrate.